Development of Wide Ion Beam Profile Measurement Method for a Period-by-Period Extreme Ultraviolet Multilayer Milling System
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概要
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To develop an ion milling system for multilayer mirrors in the extreme ultraviolet (EUV) wavelength region, the current density profile of a $\phi 100$-mm-ion beam has been measured by plural methods. The profile has been measured indirectly via milling thickness by an optical surface profiler (WYKO TOPO-2D) and an X-ray diffractometer. Direct current detection by a commercial Faraday cup and a newly developed array electrode sensor was also performed. These methods were compared and evaluated in terms of their experimental results. It was demonstrated that our array electrode sensor is useful for observing a wide ion beam profile with reasonable accuracy.
- 2010-12-25
著者
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Sakai Yu
Institute Of Environmental Toxicology
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Tsuru Toshihide
Institute Of Multidisciplinary Research For Advanced Materials Tohoku University
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Yamamoto Masaki
Institute Of Materials Science University Of Tsukuba
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Tsuru Toshihide
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Tosaka Aki
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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Sakai Yu
Institute of Multidisciplinary Research for Advanced Materials, Tohoku University, 2-1-1 Katahira, Aoba-ku, Sendai 980-8577, Japan
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