Structural Characterization of Sputtered Silicon Thin Films after Rapid Thermal Annealing for Active-Matrix Organic Light Emitting Diode

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概要

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• The microcrystalline phase obtained by adopting a two-step rapid thermal annealing (RTA) process for rf-sputtered silicon films deposited on thermally durable glass was characterized. The optical properties, surface morphology, and internal stress of the annealed Si films are investigated. As the thermally durable glass substrate allows heating of the deposited films at high temperatures, micro-polycrystalline silicon (micro-poly-Si) films of uniform grain size with a smooth surface and a low internal stress could be obtained after annealing at 750 °C. The thermal stress in the Si films was 100 times lower than that found in the films deposited on conventional glass. Uniform grains with an average grain size of 30 nm were observed by transmission electron microscopy (TEM) in the films annealed at 800 °C. These micro-poly-Si films have potential application for fabrication of uniform and reliable thin film transistors (TFTs) for large scale active-matrix organic light emitting diode (AMOLED) displays.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2010-12-25

著者

• OKADA Tatsuya

  Faculty of Engineering, The University of Tokushima

• Noguchi Takashi

  Faculty Of Agriculture Yamaguchi University

• Chen Yi

  Faculty of Engineering, University of the Ryukyus, Senbaru, Nishihara, Okinawa 903-0213, Japan

• Mugiraneza Jean

  Faculty of Engineering, University of the Ryukyus, 1 Senbaru, Nishihara, Okinawa 903-0213, Japan

• Miyahira Tomoyuki

  Faculty of Engineering, University of the Ryukyus, 1 Senbaru, Nishihara, Okinawa 903-0213, Japan

• Sakamoto Akinori

  Faculty of Engineering, University of the Ryukyus, 1 Senbaru, Nishihara, Okinawa 903-0213, Japan

• Itoh Taketsugu

  Corning Holding, Japan G.K., Akasaka Intercity, 1-11-44, Akasaka, Minato, Tokyo 107-0052, Japan

• Chen Yi

  Faculty of Engineering, University of the Ryukyus, 1 Senbaru, Nishihara, Okinawa 903-0213, Japan

• Okada Tatsuya

  Faculty of Engineering, University of the Ryukyus, 1 Senbaru, Nishihara, Okinawa 903-0213, Japan

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• Structural Characterization of Sputtered Silicon Thin Films after Rapid Thermal Annealing for Active-Matrix Organic Light Emitting Diode

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