Structural Properties of Iron Silicide Nanostructures Grown by Reactive Deposition Epitaxy

概要

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Iron silicide particles were grown on Si(100) by reactive deposition epitaxy. By maintaining the thickness of the deposited Fe down to 2 nm, silicide particles with diameters of less than 100 nm were formed on Si(100) substrates. Type B FeSi(CsCl) or $\gamma$-FeSi2 nanoparticles and a few $\beta$-FeSi2 nanoparticles were formed at 500 °C. Type A and B $\gamma$-FeSi2, $\alpha$-FeSi2, and $\beta$-FeSi2 nanoparticles coexisted in the samples deposited at 600 °C. The $\alpha$-FeSi2 phase was predominant in the sample that was deposited at 700 °C. Among these iron silicide nanoparticles, $\alpha$-FeSi2 and $\beta$-FeSi2 nanoparticles tended to protrude out of the Si substrate and FeSi(CsCl) and $\gamma$-FeSi2 nanoparticles preferred to embed in the Si substrate. The mechanism of the formation of a faceted nanoparticle was discussed on the basis of the minimization of total surface energy.
2009-08-25