In situ Observation of Layer-by-Layer Growth in Vapor Deposition of Organic Thin Films
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概要
- 論文の詳細を見る
The thin film formation processes at the initial stage of the vapor deposition of organic long-chain molecules were monitored using a quartz crystal microbalance. The growth rate of the thin films was strongly dependent on the substrate temperature. At substrate temperatures below 287 K, film growth proceeded at a uniform rate. At substrate temperatures above 297 K, no film was formed owing to a higher rate of reevaporation. Of particular interest is a stepwise increase in the amount of molecules adsorbed at 293 K, where each step height corresponded to the molecular length. These results suggest that layer-by-layer growth proceeds with a molecular orientation normal to the substrate under the conditions where reevaporation dominates the film growth process.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2009-02-25
著者
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Minagawa Yuko
Department of Materials Science and Chemical Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
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Ito Takaya
Department of Materials Science and Chemical Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
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Kubono Atsushi
Department of Materials Science and Chemical Engineering, Shizuoka University, Hamamatsu 432-8561, Japan
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