Impacts of Mold Geometries and Imprinted Resist Thickness on Velocity Fields for Nanoimprint Lithography

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概要

• 論文の詳細を見る

• This paper investigates the effect of various mold geometries and imprinted resist thickness on the velocity of imprinted resist through theoretical models and numerical simulations during thermal nanoimprint lithography. In simulations, the lateral and vertical velocity distributions are performed under various cavity half-widths, convexity half-widths, and resist thicknesses. Furthermore, the mean and maximum lateral velocities, located at cavity sidewall, and the mean vertical velocity, located at convexity surface, can be calculated by statistics analysis in numerical simulations. In this work, the simulations and theoretical models provide a deep understanding of polymer flow, affected by mold geometries and imprinted resist thickness.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-06-25

著者

• Lin Chien-hung

  Department Of Earth Science National Cheng Kung University

• Lin Chien-Hung

  Department of Power Mechanical Engineering, National Tsing Hua University, No. 101, Sec. 2, Kuang Fu Road, Hsinchu 30013, Taiwan

• Chen Rongshun

  Department of Power Mechanical Engineering, National Tsing Hua University, No. 101, Sec. 2, Kuang Fu Road, Hsinchu 30013, Taiwan

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