Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp

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概要

• 論文の詳細を見る

• As small as 100 nm patterns were successfully transferred onto a non-planar acryl substrate using both UV nanoimprinting and hot embossing techniques. Two different types of flexible imprint stamps, electroformed nickel foil stamp and molded water-soluble poly(vinyl alcohol) (PVA) stamp, were used. 100 nm line and space pattern of Si master was successfully transferred to nickel foil stamp and PVA stamp and their patterns were also transferred to the surface of curved acryl substrate using either UV nanoimprint lithography or hot embossing lithography.

• 2008-05-25

著者

• Han Kang-Soo

  Division of Materials Science and Engineering, Korea University, Seoul 136-701, Korea

• Lee Heon

  Division of Materials Science and Engineering, Korea University, Seoul 136-701, Korea

• Hong Sung-Hoon

  Division of Materials Science and Engineering, Korea University, Seoul 136-701, Korea

• Choi Kyung-Woo

  Korea Institute of Nuclear Safety, 19 Gusung-dong, Yusung-gu, Daejeon 305-338, Korea

• Byeon Kyeong-Jae

  Division of Materials Science and Engineering, Korea University, Seoul 136-701, Korea

関連論文

• Fabrication of Moth-Eye Structure on Glass by Ultraviolet Imprinting Process with Polymer Template
• Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp
• Failure Analysis of Ge2Sb2Te5 Based Phase Change Memory
• UV Curing Nanoimprint Lithography for Uniform Layers and Minimized Residual Layers

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