UV Curing Nanoimprint Lithography for Uniform Layers and Minimized Residual Layers

スポンサーリンク

概要

• 論文の詳細を見る

• Due to its ability to produce nanosized patterns on large area substrates with high throughput, UV curing nanoimprinting lithography is a promising technology for nanosized pattern fabrication. However, for it to become a technology for the mass production of nanosized patterns, we must first show that UV curing imprint lithography can produce a uniform layer with minimal residue. In this study, a pressurized chamber imprinting system was used. Isotropic pressure was applied to insure effective delivery of pressing force and uniform pressing. A UV curable resin, consisting of a perfluorinated acrylate and a photo-initiator, was used. The factors determining residual layer thickness in UV curing imprint lithography were investigated. To obtain imprinted patterns with no residual layer, a thin and uniform initial resin layer and pressurized imprinting must be used to rearrange the resin effectively. The high fidelity transfer of various patterns as small as 150 nm with no residual layer was successfully demonstrated by controlling the initial resin thickness at an imprint pressure of 15 atm.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-12-15

著者

• Lee Heon

  Division of Materials Science and Engineering, Korea University, Seoul 136-701, Korea

• Jung Gun-Young

  QSR Group, Hewlett Packard Laboratories, Palo Alto, CA, USA

関連論文

• Fabrication of Moth-Eye Structure on Glass by Ultraviolet Imprinting Process with Polymer Template
• Fabrication of Sub-100 nm Sized Patterns on Curved Acryl Substrate Using a Flexible Stamp
• Failure Analysis of Ge2Sb2Te5 Based Phase Change Memory
• UV Curing Nanoimprint Lithography for Uniform Layers and Minimized Residual Layers

スポンサーリンク