Ion Beam Deposition of Quantum Dots from Colloidal Solution
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概要
- 論文の詳細を見る
A newly developed ion beam deposition technique for fabrications of organic free quantum dot (QD) structured thin films from colloidal solutions of surfactant-capped nanocrystalline provides a uniform speed to electrosprayed QD ions independently of its form. A CdSe/ZnS QDs ion beam was generated from a colloidal solution source to deposit onto a substrate in a vacuum chamber. The energy spectra of the quantum dots ion beam were measured using an energy analyzer. We discuss appropriate conditions for a valid deposition onto a substrate in terms of ion energy. The ion energy provided from a free jet accelerator was set at 6 keV, or 0.25 eV/atom (Cd, Se). A cross-sectional transmission electron microscopy image of the deposited film shows that the deposited QDs are densely packed in a polycrystalline thin film configuration. Photoluminescence (PL) collected from the deposited film provides evidence that the deposited QDs are preserved. These suggest the soft landing of the QDs with appropriate surface passivations.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2008-04-25
著者
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Kobayashi Satoshi
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Tani Yuki
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Kawazoe Hiroshi
R&D Center, HOYA Corporation, 3-3-1 Musashino, Akishima, Tokyo 196-8510, Japan
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Tani Yuki
R&D center, HOYA Corporation, 3-3-1 Musashino, Akishimai, Tokyo 196-8510, Japan
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Kobayashi Satoshi
R&D center, HOYA Corporation, 3-3-1 Musashino, Akishimai, Tokyo 196-8510, Japan
関連論文
- Quantum Dot Activated All-inorganic Electroluminescent Device Fabricated Using Solution-Synthesized CdSe/ZnS Nanocrystals
- Ion Beam Deposition of Quantum Dots from Colloidal Solution
- Ion Beam Deposition Technique for Fabricating Luminescent Thin Films from a Solution of Nanocrystalline Semiconductor Dots