Low-Pressure Alcohol Chemical Vapor Deposition of Single-Wall Carbon Nanotubes with In situ Catalyst Deposition

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概要

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• A low-pressure chemical vapor deposition (CVD) system with in situ catalyst deposition capability has been fabricated to grow single-wall carbon nanotubes (SWNTs) in a controlled manner. To clarify the unique of the low-pressure CVD technique, the effect of Ar gas introduction while heating the sample up to the growth temperature and the effect of the "in situ deposition" of the catalyst metal on the yield of SWNTs have been investigated. It has been found that the highest yield of SWNTs is obtained when the "in situ deposition" and "without-Ar" conditions are used.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2008-04-25

著者

• Shiokawa Takao

  Advanced Device Laboratory The Institute Of Physical And Chemical Research (riken)

• Shiokawa Takao

  Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-0198, Japan

• Yoshida Hiroshi

  Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-0198, Japan

• Asakura Masahiro

  Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-0198, Japan

• Ihibashi Koji

  Advanced Device Laboratory, The Institute of Physical and Chemical Research (RIKEN), Wako, Saitama 351-0198, Japan

関連論文

• Low Pressure Chemical Vapor Deposition of Single-Wall Carbon Nanotubes
• Low-Pressure Alcohol Chemical Vapor Deposition of Single-Wall Carbon Nanotubes with In situ Catalyst Deposition
• Low Pressure Chemical Vapor Deposition of Single-Wall Carbon Nanotubes

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