Pattern Size Reduction of Nanoprint-Fabricated Structures on Heat-Shrinkable Film

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概要

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• By combination of nanoimprint technology and shrinking of the flexible film, we can fabricate a pattern which has a smaller pitch than initial mold pattern. Direct nanoprinting technique is used for pattern fabrication onto a heat shrinkable film. After pattern transferring, the film is shrunk by heating. Simultaneously, the pattern on the film can be shrunk. We find that a surface protection layer on the film keeps a pit pattern during heat-shrinking process. We successfully shrink a pattern with a pitch of 100 nm to a pattern with a pitch of about 60 nm.

• 2007-09-30

著者

• YOKOO Atsushi

  NTT Basic Research Laboratories

• Kimerling Lionel

  Massachusetts Institute of Technology, Cambridge, MA 02139-4307, U.S.A.

• Wada Kazumi

  Massachusetts Institute of Technology, Cambridge, MA 02139-4307, U.S.A.

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