Pattern Size Reduction of Nanoprint-Fabricated Structures on Heat-Shrinkable Film
スポンサーリンク
概要
- 論文の詳細を見る
By combination of nanoimprint technology and shrinking of the flexible film, we can fabricate a pattern which has a smaller pitch than initial mold pattern. Direct nanoprinting technique is used for pattern fabrication onto a heat shrinkable film. After pattern transferring, the film is shrunk by heating. Simultaneously, the pattern on the film can be shrunk. We find that a surface protection layer on the film keeps a pit pattern during heat-shrinking process. We successfully shrink a pattern with a pitch of 100 nm to a pattern with a pitch of about 60 nm.
- 2007-09-30
著者
-
YOKOO Atsushi
NTT Basic Research Laboratories
-
Kimerling Lionel
Massachusetts Institute of Technology, Cambridge, MA 02139-4307, U.S.A.
-
Wada Kazumi
Massachusetts Institute of Technology, Cambridge, MA 02139-4307, U.S.A.
関連論文
- Magnetic Domain Imaging of Ni Micro Ring and Micro Dot array by Photoelectron Emission Microscopy
- Monocrystalline 2-Adamantylamino-5-Nitropyridine (AANP) : a Novel Organic Material for Laser Raman Converters in the Visible and Near-IR
- Oxidation Patterning of GaAs by Nanoelectrode Lithography
- Ideally Ordered Metal Hole Arrays with High Aspect Ratios Prepared from Anodic Porous Alumina
- Photonic Band Gap in Anodic Porous Alumina with Extremely High Aspect Ratio Formed in Phosphoric Acid Solution
- Nanoelectrode Lithography
- 63-nm-Pitch Pit Pattern Fabricated on Polycarbonate Surface by Direct Nanoprinting
- Organic Photonic Crystal Band Edge Laser Fabricated by Direct Nanoprinting
- Pattern Size Reduction of Nanoprint-Fabricated Structures on Heat-Shrinkable Film
- Oxidation Patterning of GaAs by Nanoelectrode Lithography
- Organic Photonic Crystal Band Edge Laser Fabricated by Direct Nanoprinting
- Magnetic Domain Imaging of Ni Micro Ring and Micro Dot array by Photoelectron Emission Microscopy
- Nanoelectrode Lithography