Orientation of Thin Films Synthesized from Silicon Phthalocyanine Dichloride on a Highly Oriented Pyrolytic Graphite Investigated Using Near Edge X-ray Absorption Fine Structure
スポンサーリンク
概要
- 論文の詳細を見る
Molecular orientation of thin films of silicon phthalocyanine (SiPc) compounds on highly oriented pyrolytic graphite (HOPG) was investigated by near edge X-ray absorption fine structure (NEXAFS) and X-ray photoelectron spectroscopy (XPS). The films were prepared by a casting method using solution of SiPc dichloride. XPS results showed that the chlorine atoms in SiPc dichloride were substituted by oxygen atoms when the film was heated in the air. The orientation of the molecules with respect to the substrate plane was investigated by the polarization dependences of the Si $K$ edge NEXAFS spectra. For the sample heated in the air, two clear peaks appeared in the NEXAFS spectra at around 1847.2 and 1852.4 eV, which were assigned to $\text{Si 1s}\rightarrow\sigma_{\text{Si--N}}^{*}$ and $\text{Si 1s}\rightarrow\sigma_{\text{Si--O}}^{*}$, respectively. The intensities of the resonance peaks showed strong polarization dependence. A quantitative analysis of the polarization dependence revealed that the Si–N bond was lying down while the Si–O bond was out of the plane.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2007-02-15
著者
-
Hirao Norie
Japan Atomic Energy Agency
-
DENG Juzhi
Japan Atomic Energy Agency
-
SEKIGUCHI Tetsuhiro
Japan Atomic Energy Agency
-
HONDA Mitsunori
Japan Atomic Energy Agency
-
Baba Yuji
Japan Atomic Energy Agency
-
Deng Juzhi
Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan
-
Honda Mitsunori
Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan
-
Hirao Norie
Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan
-
Sekiguchi Tetsuhiro
Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan
-
Baba Yuji
Japan Atomic Energy Agency, Tokai-mura, Naka-gun, Ibaraki 319-1195, Japan
関連論文
- Synthesis and characterization of bulky mesoporous silica Pd-MCM-41( Innovative Ceramic Materials and Technologies for Global Environmental Protection)
- Orientation of Thin Films Synthesized from Silicon Phthalocyanine Dichloride on a Highly Oriented Pyrolytic Graphite Investigated Using Near Edge X-ray Absorption Fine Structure
- Synchrotron Radiation Studies of the Orientation of Thin Silicon Phthalocyanine Dichloride Film on HOPG Substrate
- Characterization of Phosphorus Pile-Up at the SiO_2/Si Interface
- Chemical-State-Selective Mapping at Nanometer Scale Using Synchrotron Radiation and Photoelectron Emission Microscopy
- X-Ray photoelectron Spectroscopic Observation on the Formation of Carbon Nitride Thin Films Produced by Low-Energy Nitrogen Ion Implantation
- THE ORIENTATION OF CHEMISORBED FORMATE USING K-EDGE PHOTOABSORPTION SPECTROSCOPY
- Photoluminescence and X-ray Absorption Fine Structure Analysis of Sm-Doped TiO Thin Films (Special Issue : Microprocesses and Nanotechnology)
- Orientation of Thin Films Synthesized from Silicon Phthalocyanine Dichloride on a Highly Oriented Pyrolytic Graphite Investigated Using Near Edge X-ray Absorption Fine Structure