Reduction in sidelobe level in ultracompact arrayed waveguide grating demultiplexer based on Si wire waveguide
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概要
- 論文の詳細を見る
We designed and fabricated 70×75μm^2 arrayed waveguide grating demultiplexer consisting of Si slab and wire waveguides on a silicon-on-insulator substrate. By optimizing the connection between components and the layout of arrayed waveguides, internal light scattering and the increase in phase error were suppressed. As a result, clear demultiplexing characteristics were observed with a channel spacing of 8 nm and a sidelobe level of-22 dB in the wavelength range from 1.5 to 1.6μm.
- 応用物理学会の論文
- 2006-08-15
著者
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Ohno Fumiaki
Department Of Electrical And Computer Engineering Yokohama National University
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Baba Toshihiko
Department Of Electrical And Computer Engineering Yokohama National University
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Sasaki Kosuke
Department of Electrical and Computer Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Sakaki Kosuke
Department of Electrical and Computer Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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Motegi Ayumu
Department of Electrical and Computer Engineering, Yokohama National University, 79-5 Tokiwadai, Hodogaya-ku, Yokohama 240-8501, Japan
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