InP Etching by HI/Xe Inductively Coupled Plasma for Photonic-Crystal Device Fabrication
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概要
- 論文の詳細を見る
- 2006-01-25
著者
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IDE Toshihide
Department of Electronics and Communications, School of Science and Technology, Meiji University
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BABA Toshihiko
Department of Electrical and Computer Engineering, Yokohama National University
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Ide Toshihide
Department Of Electrical And Computer Engineering Yokohama National University
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Mizuta Eiichi
Department Of Electrical And Computer Engineering Yokohama National University
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HASHIMOTO Jun-ichi
Department of Electrical and Computer Engineering, Yokohama National University
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NOZAKI Kengo
Department of Electrical and Computer Engineering, Yokohama National University
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Nozaki Kengo
Department Of Electrical And Computer Engineering Yokohama National University
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Hashimoto Jun-ichi
Department Of Electrical And Computer Engineering Yokohama National University
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Baba Toshihiko
Department Of Electrical And Computer Engineering Yokohama National University
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