Design and Evaluation of Two Dimensional Metrological Atomic Force Microscope using a Planar Nanoscanner
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概要
- 論文の詳細を見る
An atomic force microscope (AFM) using a laser interferometer is regarded as one of the best solutions for the standardization of two dimensional length measurement systems. We propose a new two dimensional (2D) metrological AFM system, which uses an orthogonally decoupled $XY$ scanner and a commercial AFM head. We designed a decoupled planar scanner having minimal parasitic errors, particularly crosstalk errors. The parasitic tilt error was measured and evaluated using an autocollimator. Furthermore, we evaluated the uncertainty of the combined system according to the Guide to the Expression of Uncertainty in Measurement.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2006-03-15
著者
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Gweon Dae-gab
Department Of Mechanical Engineering Korea Advanced Institute Of Science And Technology
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Lee Dong-yeon
Department Of Mechanical Engineering Korea Advanced Institute Of Science And Technology
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Kim Dong-Min
Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, 373-1, Guseong-dong, Yuseong-ku, Daejeon 307-701, Korea
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Lee Dong-Yeon
Department of Mechanical Engineering, Korea Advanced Institute of Science and Technology, 373-1, Guseong-dong, Yuseong-ku, Daejeon 307-701, Korea
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Kim Dong-Min
Department of Chemistry, Pusan National University
関連論文
- Orthogonality Correction of Planar Sample Scanner for Atomic Force Microscope
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