New Write-Once Medium with NiOx Film Using Blue Laser
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概要
- 論文の詳細を見る
Both a new write-once medium with a sputtered NiOx film and a write-once optical disk using a blue laser has been fabricated. The optical constant of sputtered NiOx films for different ratios of O2/Ar was determined, and showed little dependence on sputtering ratios of O2/Ar and wavelength. The X-ray photoelectron spectra (XPS) data indicated those films have two major components, NiO and Ni2O3. Most NiOx films released oxygen gradually below 300°C. Over 300°C, there was an apparent transition due to the decomposition of the Ni2O3. At a writing power of 12 mW and a reading power of 0.5 mW under conditions of a numerical aperature (NA) of 0.65 and a wavelength of 405 nm, the carrier to noise ratio (CNR) was more than 47 dB and jitter was less than 13%. The recording principle depends primarily on the explosive pressure of the O2 released due to laser heating of the NiOx film.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-08-15
著者
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Ju Jau-jiu
Opto-electronics & System Labs. Industrial Technology Research Institute
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HUANG DerRay
Opto-Electronics & Systems Lab.
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Yen Wen-Hsin
Opto-Electronics and Systems Laboratory, ITRI, 195-4, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.
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Chang Hung-Lu
Opto-Electronics and Systems Laboratory, ITRI, 195-4, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.
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Chen Jung-Po
Opto-Electronics and Systems Laboratory, ITRI, 195-4, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.
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Yen Pofu
Opto-Electronics and Systems Laboratory, ITRI, 195-4, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.
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Huang Derray
Opto-Electronics and Systems Laboratory, ITRI, 195-4, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.
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Jeng Tzuzn-Ren
Opto-Electronics and Systems Laboratory, ITRI, 195-4, Sec. 4, Chung Hsing Rd., Chutung, Hsinchu, Taiwan, R.O.C.
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- New Write-Once Medium with NiOx Film Using Blue Laser