Mobility and Charge Density Tuning in Double-Doped Enhancement-Mode Pseudomorphic High-Electron-Mobility Transistors Grown by Metalorganic Chemical Vapor Deposition
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概要
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We present mobility and charge density tuning for metalorganic chemical vapor deposition (MOCVD)-grown double-doped enhancement-mode (E-mode) pseudomorphic high-electron-mobility transistors (PHEMTs) by varying the supplier layer doping level and spacer layer thickness. From the resolvable Pendellosung oscillation in double-crystal X-ray diffraction measurements and a pronounced two-dimensional electron-gas peak in capacitance–voltage ($C$–$V$) analyses, good epitaxial wafers are obtained by MOCVD. The 1-μm-gate-length E-mode PHEMT device exhibits a good pinch-off characteristic with a threshold voltage of 0.025 V and a maximum transconductance of 203 mS/mm. The dependences of the pinch-off characteristic in $C$–$V$ measurement on sheet carrier concentration and spacer layer thickness for E-mode PHEMT application is also described in detail.
- Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
- 2005-08-15
著者
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Lee Chong-yi
Department Of Electrical Engineering National Tsing Hua University:department Of Electrical Engineer
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Wu Hsin-Yen
Epistar Co., 5 Li-hsin 5th Rd., Science-Based Industrial Park, Hsinchu, Taiwan 300, Republic of China
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Kuo Kuan-Chu
Epistar Co., 5 Li-hsin 5th Rd., Science-Based Industrial Park, Hsinchu, Taiwan 300, Republic of China
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Lee Chong-Yi
Department of Electronic Engineering, I-Shou University, Ta-Hsu Hsiang, Kaohsiung County, Taiwan 840, Republic of China
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Lin Wen-Hsiang
Epistar Co., 5 Li-hsin 5th Rd., Science-Based Industrial Park, Hsinchu, Taiwan 300, Republic of China
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Shiao Hung-Pin
Department of Electrical Engineering, Da-Yeh University, Da-Tsuen Hsiang, Chang-Hua, Taiwan 515, Republic of China
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- Mobility and Charge Density Tuning in Double-Doped Enhancement-Mode Pseudomorphic High-Electron-Mobility Transistors Grown by Metalorganic Chemical Vapor Deposition
- Elimination of Burn-in Effect in Metal–Organic Chemical Vapor Deposition Grown InGaP/GaAs Heterojunction Bipolar Transistors by Multistep In situ Annealing