Filtered Cathodic Vacuum Arc Process Conditions and Properties of Thin Tetrahedral Amorphous Carbon Films

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概要

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• The properties of thin tetrahedral amorphous carbon films were evaluated for various deposition conditions using a filtered cathodic vacuum arc process. The most marked change observed in the properties of the films caused by varying the arc current and substrate bias was the change in the compressive stress of the films. It was found that C+ ion energy values ranging from 55 to 75 eV are optimum for obtaining very hard tetrahedral amorphous carbon coatings.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-05-15

著者

• Sasaki Shinji

  Storage Technology Research Center Research & Development Group Hitachi Ltd.

• Inaba Hiroshi

  Storage Technology Research Center Research & Development Group Hitachi Ltd.

• Furusawa Kenji

  Storage Technology Research Center, Research & Development Group Hitachi, Ltd., 292 Yoshida-cho, Totsuka-ku, Yokohama 244-0817, Japan

関連論文

• Properties of Diamond-Like Carbon FilmsFabricated by the Filtered Cathodic Vacuum Arc Method
• Filtered Cathodic Vacuum Arc Process Conditions and Properties of Thin Tetrahedral Amorphous Carbon Films

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