Deformation Mechanism and Punch Taper Effects on Nanoimprint Process by Molecular Dynamics

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概要

• 論文の詳細を見る

• A molecular dynamics analysis model is proposed to study the effects of parameters on the nanoimprint process, for example, taper angle, imprint depth and spring back. The nanoimprint process comprises one punch and one specimen at an isothermal state of 400 K, while the deformed material is a copper fcc single crystal and the punch material is a nickel fcc single crystal. There were a total of 10,080 atoms in copper measuring 12.02 nm and 5.72 nm in length and height, respectively. There were a total of 4,200 atoms in nickel with a typical length and depth in a punch tooth of 6.24 nm and 3.52 nm, respectively. Computer simulation codes based on Hamiltonian dynamics, periodical boundary conditions and the Morse potential function were used to simulate the nanoimprint process. By varying the punch taper angle and the imprint depth, useful information about the nanoimprint process was obtained.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2004-11-15

著者

• Fang Te-hua

  Department Of Mechanical Engineering Southern Taiwan University

• Wu Chen-Da

  Graduate School of Mechanical and Precision Engineering, National Kaohsiung University of Applied Sciences, 415 Chien-Kung Road, Kaohsiung 807, Taiwan, R.O.C.

• Hsu Quang-Cherng

  Graduate School of Mechanical and Precision Engineering, National Kaohsiung University of Applied Sciences, 415 Chien-Kung Road, Kaohsiung 807, Taiwan, R.O.C.

• Fang Te-Hua

  Department of Mechanical Engineering, Southern Taiwan University, 1 Nan-Tai Road, Tainan 710, Taiwan, R.O.C.

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• Deformation Mechanism and Punch Taper Effects on Nanoimprint Process by Molecular Dynamics

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