Batch Fabrication of Sharpened Silicon Nitride Tips

スポンサーリンク

概要

• 論文の詳細を見る

• A novel sharpening technique for silicon nitride protrusions is reported. A silicon-rich nitride film, which contains more silicon than a stoichiometric silicon nitride film, shows low film stress and has been applied to micro mechanical devices. We found that the edge of the silicon nitride pattern on the silicon wafer became thinner and tapered by thermal oxidation, followed by the removal of the oxidized layer. By applying this technique for sharpening the apex of a beak-like cantilever of silicon nitride, the tip of the acute-angle triangular plate portion of the cantilever terminated into one and was sharpened with a radius of curvature of 17 nm. The small cantilevers integrated with the sharp protrusions for high speed atomic force microscopy in water were batch fabricated. The technique is useful for the fabrication of small cantilevers when low cost is required.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-07-15

著者

• Kitazawa Masashi

  Micro Component Engineering Department Olympus Optical Co. Ltd.

• Toda Akitoshi

  Scientific Equipment Division Olympus Optical Co. Ltd.

• Toda Akitoshi

  Scientific Equipment Division, Olympus Optical Co., Ltd., 2951 Ishikawa-cho, Hachioji, Tokyo 192-8507, Japan

• Kitazawa Masashi

  Micro Component Engineering Department, Olympus Optical Co., Ltd., 6666 Inatomi Tatsuno, Nagano 399-0495, Japan

• Shiotani Koichi

  Micro Component Engineering Department, Olympus Optical Co., Ltd., 6666 Inatomi Tatsuno, Nagano 399-0495, Japan

関連論文

• Fabrication of Sharp Tetrahedral Probes with Platinum Coating
• Silicon Tip Cantilevers for Force Microscopy in Water with Resonance of 20 kHz or Above
• Batch Fabrication of Sharpened Silicon Nitride Tips

スポンサーリンク