High Resolution in Heat-Resistant Optical Polymer by Electron-Beam Exposure and Thermal Development

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概要

• 論文の詳細を見る

• A type of polyarylate (U100) with high glass-transition temperature ($T_{\text{g}}$: 193°C) has high optical transparency and thermal stability of refractive index and absorption. U100 can be processed by electron-beam (EB) exposure and thermal development. We study the optimum EB dose, temperature and time of thermal development, and film thickness, in order to achieve high-resolution processing in submicron size. We have successfully fabricated a high-resolution surface relief grating on the U100 thin film. The grating has the diffraction efficiency of 4.1%, and the efficiency did not change by heating for 100 h at 100°C.

• Published by the Japan Society of Applied Physics through the Institute of Pure and Applied Physicsの論文
• 2003-04-15

著者

• OKAMOTO Naomichi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University

• Tomiki Masahiro

  Graduate School Of Electronic Science And Technology Shizuoka University

• Sugihara Okihiro

  Department Of Electrical Engineering Faculty Of Science And Technology Keio University

• FUJIMURA Hisashi

  Department of Electronic Engineering, Faculty of Engineering, Shizuoka University

• Tomiki Masahiro

  Graduate School of Electronic Science and Technology, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, Japan

• Okamoto Naomichi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, Japan

• Sugihara Okihiro

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, Japan

• Fujimura Hisashi

  Department of Electrical and Electronic Engineering, Faculty of Engineering, Shizuoka University, 3-5-1 Johoku, Hamamatsu, Shizuoka 432-8561, Japan

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