Formation of Hard Amorphous Hydrogenated Carbon Films with Low Hydrogen Concentration and Their Erosion in Air
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概要
- 論文の詳細を見る
Hard amorphous hydrogenated carbon (a-C:H) films are prepared by radio-frequency plasma deposition from a mixture of CH4 and Ar. When these films are heated up to 1220 K under vacuum, they release Ar, a large amount of H2 and a small amount of hydrocarbon, but the thickness of the films does not decrease. In addition, their micro-Vickers hardness decreases, but they remain hard. If these hydrogen-free semihard a-C:H films are heated at 670 K in air for 1 h, they become soft and uptake oxygen and hydrogen. On the other hand, if the original hard a-C:H films are heated under similar conditions, they remain hard without releasing argon or uptaking oxygen. It is concluded that the reduction of hydrogen does not lead to the formation of new cross linking C–C bonds, and the pore size of the films increases after heating allowing the penetration of oxygen and water vapor into the films.
- Publication Office, Japanese Journal of Applied Physics, Faculty of Science, University of Tokyoの論文
- 2001-02-15
著者
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Jacob Wolfgang
Max-Planck-Institut fur Plasmaphysik
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Maruyama Kazunori
Department Of Agricultural Chemistry Faculty Of Agriculture The University Of Tokyo
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Jacob Wolfgang
Max-Planck-Institut fur Plasmaphysik (EURATOM Association), D-85748 Garching, Germany
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Roth Jachim
Max-Planck-Institut fur Plasmaphysik (EURATOM Association), D-85748 Garching, Germany
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Maruyama Kazunori
Department of Chemistry, Nagaoka University of Technology, Kamitomioka, Nagaoka, 940-2188, Japan
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Roth Joachim
Max-Planck-Institut fur Plasmaphysik (EURATOM Association), D-85748 Garching, Germany
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