Two Dimensional Fluid Model of RF Plasmas in SiH4/Ar Mixtures

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概要

• 論文の詳細を見る

• A self-consistent two dimensional numerical fluid model of rf plasmas under conditions close to those of the experiments for observing particle growth in silane rf plasmas has been developed. The geometry of the discharge chamber and the electrodes used in the model is cylindrically symmetric: two cylinders for the electrodes are surrounded by the grounded chamber. The rf plasmas are in SiH4(10%)/Ar(90%) at a pressure of 100 mTorr at 6.5 MHz. The results from the model, including the rf plasma structures and the generation rates for radicals, SiH, SiH2 and SiH3, are presented. Effects of the applied rf voltage and the secondary electron emission coefficient on the generation rates of the radicals are discussed.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1997-07-30

著者

• Shida Yutaka

  Faculty Of Education Iwate University

• Sato Nobuyasu

  Faculty Of Education Iwate University

• Sato Nobuyasu

  Faculty of Education, Iwate University, Morioka 020, Japan

関連論文

• Two Dimensional Fluid Model of RF Plasmas in SiH_4/Ar Mixtures
• Effect of Gas Flow on RF Plasmas
• Modeling of Particle Growth in RF Silane-Helium Plasma ( Plasma Processing)
• Two Dimensional Fluid Model of RF Plasmas in SiH4/Ar Mixtures

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