Effect of Degree of Coherence in Optical Lithography Using Dummy Diffraction Mask
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概要
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The effects of degree of coherence in optical lithography using the dummy diffraction mask are investigated by simulation and experiment. Influences on resolution and depth of focus of the repeated and isolated patterns are simulated for the several coherence factors of the illumination. The process margins are also simulated through the exposure vs. defocus diagram. The lithographic performances of the complex periodic patterns are experimented. As degree of coherence (DOC) decreases, the contrast benefit is increased for line and space(L/S) patterns size less than 0.5 λ/NA where NA is the numerical aperture, and the depth of focus(DOF) benefit is increased for L/S patterns size less than 0.65 λ/NA. The smaller L/S patterns size is, the greater the influence of DOC is. In the isolated patterns of sub-resolution type, better lithographic performances could be obtained for the smaller coherence factor.
- 1996-02-15
著者
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Yoo Hyung
Electronics And Telecommunications Research Institute
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Oh Yong
Electronics And Telecommunications Research Institute
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Chung Hai
Electronics And Telecommunications Research Institute
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LEE Seonbok
Department of Physics Education, Seoul National University
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Lee Sungmuk
Department Of Physics Education Seoul National University
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Yim Donggyu
Department Of Physics Education Seoul National University
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Chung Hai
Electronics and Telecommunications Research Institute, Yusong P. O. Box 106, Taejon 305-600, Korea
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Yoo Hyung
Electronics and Telecommunications Research Institute, Yusong P. O. Box 106, Taejon 305-600, Korea
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Yim Donggyu
Department of Physics Education, Seoul National University, Seoul 151-742, Korea
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Lee Seonbok
Department of Physics Education, Seoul National University, Seoul 151-742, Korea
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Lee Sungmuk
Department of Physics Education, Seoul National University, Seoul 151-742, Korea
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Oh Yong
Electronics and Telecommunications Research Institute, Yusong P. O. Box 106, Taejon 305-600, Korea
関連論文
- Lithographic Performance Enhancement Using Dummy Diffraction Mask
- Effect of Degree of Coherence in Optical Lithography Using Dummy Diffraction Mask
- Effect of Degree of Coherence in Optical Lithography Using Dummy Diffraction Mask