Tungsten-Carbon X-ray Multilayered Mirror Prepared by Photo-Chemical Vapor Deposition

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概要

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• A tungsten-carbon(W/C) X-ray multilayered mirror was prepared by photoinduced chemical vapor deposition (photo-CVD) using a low-pressure mercury lamp and an argon-fluoride (ArF) excimer laser. The 40% reflectivity of this mirror was measured using a small-angle X-ray diffractometer with Cu-K$\alpha$ radiation. This reflectivity is lower than the theoretical reflectivity of 80%. From observations of the transmission electron micrograph from this multilayered mirror, it seems that the reduction of the reflectivity was caused by the indistinct interfaces of the diffused films, and by the roughness of the films introduced by partial crystallization of the tungsten films.

• INSTITUTE OF PURE AND APPLIED PHYSICSの論文
• 1989-05-20

著者

• Suzuki Yoshihiko

  Yoshida Nano-mechanism Project

• Suzuki Yoshihiko

  Yoshida Nano-Mechanism Project, JRDC, Ohi Plant, Nikon Corporation, 1-6-3, Nishi-Ohi, Shinagawa, Tokyo 140

関連論文

• Fabrication and Evaluation of X-Ray Multilayer Mirrors Prepared by Laser-Induced Chemical Vapor Deposition
• Photo-CVD Direct Patterning of Silicon Oxide Films by Optical Projection
• Tungsten-Carbon X-ray Multilayered Mirror Prepared by Photo-Chemical Vapor Deposition

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