Photo-CVD Direct Patterning of Silicon Oxide Films by Optical Projection

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概要

• 論文の詳細を見る

• patterned silicon oxide films from gaseous hexamethyldisilazane (HMDS) were deposited by a direct patterning method of photoinduced chemical vapor deposition (photo-CVD) using an argon-fluoride (ArF) excimer laser and a photomask. From Auger electron spectroscopy (AES) analysis, these films are seen to have much oxygen and carbon contamination. The growth mechanism was discussed by considering dissociation, adsorption and chemical reaction.

• 社団法人応用物理学会の論文
• 1990-08-20

著者

• Shin-ogi Masataka

  Yoshida Nano-mechanism Project

• Suzuki Yoshihiko

  Yoshida Nano-mechanism Project

関連論文

• Fabrication and Evaluation of X-Ray Multilayer Mirrors Prepared by Laser-Induced Chemical Vapor Deposition
• Photo-CVD Direct Patterning of Silicon Oxide Films by Optical Projection
• Tungsten-Carbon X-ray Multilayered Mirror Prepared by Photo-Chemical Vapor Deposition

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