Usefulness of Substrate Cleaning with Carbon Dioxide for Organic Electronic Devices
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概要
- 論文の詳細を見る
We have examined the usefulness of cleaning method using carbon dioxide (CO2) for organic electronic devices under the comparison with a UV–ozone cleaning method. No difference in both methods was observed in the contact angle and the grain size of pentacene deposited on a SiO2 wafer. We also fabricated organic field effect transistors (OFETs) using pentacene on SiO2/Si substrates treated by these two methods and compared the performance. Both OFETs gave almost the same charge carrier mobility. Because of these superiority and higher throughput, CO2 cleaning method was found to be an effective method for basic researches and manufactures of organic electronic devices.
- Japan Society of Applied Physicsの論文
- 2007-10-25
著者
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Takezoe Hideo
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Ishikawa Ken
Department Of Organic And Polymeric Materials Tokyo Institute Of Technology
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Kamei Masayuki
Link Star Japan Co., Ltd., Sakaino-cho, Kiryu, Gunma 376-0002, Japan
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Susukida Makoto
Department of Organic and Polymeric Materials, Tokyo Institute of Technology, O-okayama, Meguro-ku, Tokyo 152-8552, Japan
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