Enhancement of Nitrogen Gas Breakdown Voltage between Coated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C8F18 Vapor RF Plasma
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概要
- 論文の詳細を見る
The breakdown voltage ($V_{\text{s}}$) of nitrogen gas between aluminum (Al) sphere-sphere electrodes, which were coated with thin fluorocarbon polymer (FCP) films in a C8F18 vapor RF plasma, at a gas pressure ($p$) times gap length ($d$) between 0.6 Torr$\cdot$cm and 20 Torr$\cdot$cm was studied. The $V_{\text{s}}$ in this electrode system was enhanced threefold at $pd=1$ Torr$\cdot$cm and twofold at 20 Torr$\cdot$cm compared with $V_{\text{s}}$ between the Al electrodes. The $V_{\text{s}}$ enhancement mechanism was examined with respect to film insulation properties and secondary-electron emission from FCP film.
- INSTITUTE OF PURE AND APPLIED PHYSICSの論文
- 2003-02-15
著者
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Biloiu Costel
Division Of Electronics And Information Engineering Hokkaido University
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Suda Yoshiyuki
Division Of Electronics For Informatics Graduate School Of Information Science And Technology Hokkai
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Biloiu Ioana
Division Of Electronics And Information Engineering Hokkaido University
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Nakajima Masatoshi
Fuji Electric Co. Ltd.
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Sakai Yosuke
Division of Electronics and Information Engineering, Hokkaido University, North 13 West 8, Sapporo 060-8628, Japan
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Biloiu Costel
Division of Electronics and Information Engineering, Hokkaido University, North 13 West 8, Sapporo 060-8628, Japan
関連論文
- Equality of Higher-Order Diffusion Coefficients between Component and Composite Electron Swarms in Gas
- Enhancement of Nitrogen Gas Breakdown Voltage between Coated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C_8F_ Vapor RF Plasma
- Effect of near-threshold ionization on electron attachment in gaseous dielectrics
- Equality of Higher-Order Diffusion Coefficients between Component and Composite Electron Swarms in Gas
- A Practical Review of IEC Standards for Line Surge Arresters
- Enhancement of Nitrogen Gas Breakdown Voltage between Coated Aluminum Electrodes with Fluorocarbon Polymer Film Prepared in C8F18 Vapor RF Plasma