Low Temperature Growth of Carbon Nanomaterials on the Polymer Substrate Using Ion Assisted Microwave Plasma CVD
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概要
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In this study, the successful growth of carbon nanotubes and few-layered graphene sheets on the silicon and polyimide substrates at relatively low temperature of 230-260°C by microwave surface wave plasma CVD technique has been demonstrated. Graphite-encapsulated Ni nanoparticles have been used as the catalyst for growing carbon nanomaterials (CNMs) in NH3/CH4 plasma. The results of high-resolution transmission electron microscope(TEM) analysis show the effect of substrate on the structure of CNMs.
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The Society of Photopolymer Science and Technology (SPST) | 論文
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