The Photopolymer Science and Technology Award
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概要
- 論文の詳細を見る
The Photopolymer Science and Technology Award No.112100, the Best Paper Award 2011, was presented to Toshiro Itani and Julius Joseph Santillan (Semiconductor Leading Edge Technologies, Inc.) for their outstanding contribution published in Journal of Photopolymer Science and Technology, 23, (2010) 639-642, entitled ′Dissolution Behavior of Photoresists: An In-situ Analysis′.
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
- Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)
- Conventional Measurement Method of Film Resistance of Plasma-Polymerized Thin Films Using a High-Resistance Meter
- Synthesis and Optical Properties of Carbazole-Containing Donor-Acceptor Type Conjugated Polymers
- Novolak Resist Removal Using Laser (266/532nm)
- Evaluation of Fluorinated Diamond Like Carbon as Antisticking Layer by Scanning Probe Microscopy