The Photopolymer Science and Technology Award
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概要
- 論文の詳細を見る
The Photopolymer Science and Technology Award No. 092100, the Best Paper Award 2009, was presented to Dario L. Goldfarba, Libor Vyklickya, Sean D. Burnsa, Karen Petrillob, John Arnoldb, Anthony Lisib, Dirk Pfeiffera, Daniel P. Sandersc, Robert D. Allenc, David R. Medeirosb, Dah Chung Owe-Yangd, Kazumi Nodae, Seiichiro Tachibanae, and Shozo Shiraie (aIBM T.J. Watson Research Center, bIBM Systems & Technology Group, cIBM Almaden Research Center, dShin-Etsu MicroSi, Inc., eShin-Etsu Chemical Co.) for their outstanding contribution published in the Journal of Photopolymer Science and Technology, 21(3), 397-404 (2008), entitled "Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography".
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
- Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)
- Conventional Measurement Method of Film Resistance of Plasma-Polymerized Thin Films Using a High-Resistance Meter
- Synthesis and Optical Properties of Carbazole-Containing Donor-Acceptor Type Conjugated Polymers
- Novolak Resist Removal Using Laser (266/532nm)
- Evaluation of Fluorinated Diamond Like Carbon as Antisticking Layer by Scanning Probe Microscopy