Step and Flash Imprint Lithography Modeling and Process Development
スポンサーリンク
概要
- 論文の詳細を見る
Step and Flash Imprint Lithography (SFIL) is a low pressure, room temperature process capable of faithfully reproducing nanometer scale features. By eliminating expensive imaging optics, SFIL is able to realize this pattern transfer at low cost. Previous work has described the SFIL process in detail including a general process description, etch transfer processes, initial defect studies, polymerization kinetics, and device demonstrations. This paper documents photopolymerization induced shrinkage of the etch barrier and its effect on pattern fidelity and line profile. Results from finite element and mesoscale models are compared to imprinted etch barriers of varying shrinkage.
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
- Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane)
- Conventional Measurement Method of Film Resistance of Plasma-Polymerized Thin Films Using a High-Resistance Meter
- Synthesis and Optical Properties of Carbazole-Containing Donor-Acceptor Type Conjugated Polymers
- Novolak Resist Removal Using Laser (266/532nm)
- Evaluation of Fluorinated Diamond Like Carbon as Antisticking Layer by Scanning Probe Microscopy