Copolymers with Well-Controlled Molecular Weight and Low Polydispersity for 193 nm Photoresists
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概要
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One of the major components of a photoresist formulation is polymer resin. Many resin types including COMA, VEMA, CO and acrylates are being used in 193 nm-photoresist formulation. A set of promising resin candidates for 193 nm lithography consists of acrylate and methacrylate polymers, which have excellent absorption characteristics at 193 nm region. We have developed controlled radical polymerization (CRP) method to control the molecular weight as well as the composition of the acrylate & methacrylate copolymers over a wide range of monomer choices for the 193 nm-photoresist formulation. In this study, we prepared a pure acrylate-type copolymer with low molecular weight distribution (PDI∼1.2) and investigated it for line-and-space lithography.
- The Society of Photopolymer Science and Technology (SPST)の論文
The Society of Photopolymer Science and Technology (SPST) | 論文
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