Effect of Gas Temperature on NOx Removal by Using Dielectric Barrier Discharge

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Effect of gas temperature on NOx removal by using dielectric barrier discharge (DBD) was investigated experimentally. NO/O2/N2 system was used as the test gas. The initial NO concentration was set as 100ppm. The experiment was conducted under two conditions with and without oxygen. The gas temperature was changed in a range of Tg=20°C260°C. As the result, in the case of NO removal in nitrogen atmosphere (O2=0%), NO was mainly reduced by N radical and several ppm of NO2 and N2O were produced. NOx removal efficiency at Tg=20°C (room temperature) was slightly higher than that at Tg=60260°C. On the other hand, in the case of NOx removal in oxidative atmosphere (O2=10%), NO was mainly oxidized by O3 and reduced by N radical at Tg=20°C. At higher gas temperature conditions (Tg=60260°C), NOX concentration exceeded the initial NO concentration of 100ppm. The oxidation of NO with O3 was controlled because the amount of O3 was deceased due to the thermal decomposition of O3. Also, NO, NO2 and N2O were produced by corona discharge in oxidative atmosphere. Thus, it was considered that the increase of NOX in high temperature condition was caused by the thermal decomposition of O3 and the formation of NO, NO2 and N2O.