IVa族遷移金属への窒素イオン注入による表層薄膜組成と着色性

概要

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Non-mass analyzed nitrogen ions were implanted at dose of from 1×1017ions cm-2 to 1×1018ions cm-2 into sheets of group-VIa transition metals (Ti, Zr, Hf) and at room temperature using a Zymet implanter model Z-100 at an accelerating voltage of 90keV. Nitride formation in Ti, Zr and Hf was verifed by X-ray thin-film diffraction (TFD), and the distribution of nitrogen and oxygen was determined by glow discharge spectrometry (GDS) or Auger electron spectroscopy (AES). Reflectance and color were also determined.Ti2N, TiN, ZrN, HfN and Hf4N3 phases were observed depending on the implantation dose. Depth profiles suggest that the surface thin layer consisits of a multilayer (oxide/nitride/metal) structure containing oxides.The color of nitrogen-implanted Zr and Hf varied from yellow to reddish yellow with the level of nitrogen content. The reflectance minimum shifted to lower photon energy with increased nitrogen content. This behavior is attributed to the combined effect of the surface structure and the concentration of implanted nitrogen.
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