TiNおよびTiCコーティング膜の配向性

概要

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TiN film was coated onto SK 5 substrate by RF ion plating under different bias voltages, and X-ray diffraction analysis and ESCA measurement were performed on this film to determine the X-ray intensities of the (111) and (200) planes and the composition of the film. To evaluate the orientation of the TiN film using this X-ray intensity and composition data, the relation ship between the composition and the X-ray intensity ratio of the (111) plane to the (200) plane for randomly oriented TiN (TiC) was investigated. It was found that the composition of the TiN (TiC) affects the X-ray intensity ratio, and that the orientation of the film changed with the bias voltage. The composition also affects the packing density of each plane and, therefore, is considered to be one of the parameters which influences the orientation of the film. In addition, the orientations of previously reported TiN and TiC films coated by the PVD method were re-examined.
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