ニッケル電析の配向性, モルフォロジーと界面インピーダンス特性に及ぼすクマリンの影響

概要

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The effect of additive coumarin on the electrodeposition of nickel from Watts bath was studied using impedance measurement. The crystal orientation of the deposits was investigated by X-ray diffraction (XRD) and their morphology by scanning electron microscopy (SEM). Coumarin inhibits nickel electrodeposition, increasing the charge transfer resistance and decreasing the double layer capacitance in impedance diagrams. At current densities of 200A·m-2 and 400A·m-2, the deposits had a (200) preferred orientation structure, changing to (220) when the current density was 800A·m-2. Coumarin influenced the relaxation of the electrode coverage by an adsorbed intermediate such as (NiOH)ads and caused an increase in size of the low frequency loop, enhancing the preferred orientation as coumarin was added. Coumarin also has the effect flatting the crystal, preparing denser deposit.
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