高周波マグネトロンスパッタリング法を用いた鉄基板上への純亜鉛皮膜の結晶成長

概要

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The formation and growth of pure zinc films on iron substrates was investigated. The film formation process used was rf-magnetron sputtering, and the variable parameter that was used to affect film formation was sputtering power. At higher sputtering power the films oriented to the (002) plane in the vicinity of the interface, but (101) plane orientation increased with film thickness. Films consisted of a layer of fine particles several micrometers thick formed on the substrate, with columnar crystals on top of it. At lower sputtering power the films oriented to the (101) plane regardless of the film thickness and the columnar crystals could not be seen, but the sponge-like crystals were formed. These phenomena will be explained from the viewpoint of the adsorption inhibition.