無電解めっきによるカドミウム皮膜の形成

概要

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Electroless deposition of cadmium films was investigated using titanium trichloride as a reducing agent. Cadmium films were formed direcity on the surface of aluminum substrates activated with palladium. The deposition rate increased with increasing titanium trichloride concentration, bath temperature, and pH.Silver-like bright cadmium film was produced from a solution containing cadmium dichloride 0.08M, trisodium citrate 0.34M, disodium EDTA 0.08M, NTA 0.20M, and titanium trichloride 0.04M, at temperatures above 70°C and pHs above 9.5. Each complexing agent served as bath stabilizer as well as plating promoter. Intended thickness was obtained by renewing the bath at 30-minute intervals.Cadmium sulfide film was also electrolessly plated from the cadmium bath to which sodium thiosulfate was added. Films obtained at above pH 10.0 were of polycrystalline cadmium sulfide similar to chemically deposited films for solar cell applications.
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