ディスク型CVD装置における局所物質移動係数に及ぼす2重管式ノズルの効果

概要

論文の詳細を見る
A double-pipe nozzle capzble of supplying reactant gas in both axial and radial directions at an appropriate flow ratio was developed for the uniform growth of single-crystal silicon thin film in a disk-type CVD reactor. The effects of the ratio of reactant gas flow rate from the axial-direction nozzle to that from the radial direction nozzle, the height of the radial-direction nozzle and the distance between the top of the reactor and the carbon plate surface on the local mass transfer coefficient were investigated.<BR>The local mass transfer coefficient was made uniform by using the double-pipe nozzle under various operating conditions. For a flow ratio of 7 (radial) : 3 (axial), the local mass transfer coefficient was large and became exceedingly uniform.
社団法人化学工学会の論文