A HIGH YIELD RELEASING TECHNIQUE BY USING A SILICON OXIDE DIAPHRAGM

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概要

• 論文の詳細を見る

• The diaphragm release technique presented here contributes to improve the processing yield of suspended microstructures. We believe that it extends the range of micromachining application because it is used to structural materials other than polysilicon, and because it is compatible with existing bulk micromachining processes.

• 社団法人 電気学会の論文

著者

• Fujita Hiroyuki

  IIS, The University of Tokyo

• Toshiyoshi Hiroshi

  IIS, The University of Tokyo

関連論文

• 3次元配線アレイの開発
• Reshaping of Single-Crystal Silicon Microstructures
• A HIGH YIELD RELEASING TECHNIQUE BY USING A SILICON OXIDE DIAPHRAGM

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