露光装置における6自由度磁気浮上ステージ開発 : −設計検証(第２報)−

概要

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In this paper, a detail design of MAGLEV(MAGnetic LEVitation) stage is put into effect based on the concept that was persuaded in 1st paper, ”Development of 6DOF Magnetic Levitation Stage for Lithography Tool -Background and First Report-“, in that the limit of vacuum compatible air bearing was discussed. Because the proof of concept should be quickly required, local design such as material and component was changed from the initial concept. The key specification, control bandwidth, coupling between other axes, vibration transmissibility and positioning accuracy were evaluated and the concept was verified. The possibility of application to the EUVL(Extreme Ultra Violet Lithography tool) reticle stage is obtained by changing the material to high stiffness rate ceramics in control simulation.