露光装置における6自由度磁気浮上ステージ開発 : −背景と第１報−

概要

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At first, I explain some key points and difficulty of lithography tool design, issues that should be overcome during the development and requirements for stages in lithography tool in this paper. Then, I have ascertained a limit of static-pressure air bearing with differential pumping mechanism for vacuum application, for instance EUVL(Extreme Ultra Violet Lithography tool) by manufacturing so-called the “vacuum compatible” 1-axis air bearing and verifying the performance by comparing with equivalent model simulation. Finally, one of MAGLEV(MAGnetic LEVitated) stage concepts is proposed instead of common AIRLEV(AIR LEVitated) stage by seriously considering a high throughput for mass production. I simultaneously contribute 2nd paper, “Development of 6DOF Magnetic Levitation Stage for Lithography Tool -Proof Of Concept (Second Report)-“ which is a sequel to this paper.