露光装置におけるパラレルリンク駆動ステージの開発 : —機能検証—

概要

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At first, a possibility of application of the parallel link mechanism for semiconductor manufacturing field has been researched and discussed, then it was decided to make efforts in the parallel multi-linked stage development for EPL(Electron-beam Projection Lithography). Magnetic devices, for instance, electromagnetic linear motor, voice coil motor and electrostatic actuator have been typically utilized for higher response and finer accuracy of positioning in lithography tools, however the stage in EPL might be hopefully driven by non-magnetic device such as piezo actuator because of prevention of beam deflection. At the first phase, 4-degree stage composed of a 6-dof(degree of freedom) parallel link system was manufactured and verified in advance, then we confirmed desired static and dynamic performance after installing the stage into the production tool. At the second phase, 6-degree stage which had an ability of 6dof stroke control was produced experimentally, after that it had been evaluated at the viewpoint of reduction of coupling between axes. Better positioning accuracy and de-coupling by using link compensation, compared with 4-degree stage was finally acquired.