Selective growth of gold nanoparticles on FIB-induced amorphous phase of Si substrate
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概要
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Maskless and electroless patterning of gold was performed by a simple method: 3-mercaptopropyltrimethoxysilane (MPTMS) and an aqueous solution of hydrogen tetrachloroaurate (HAuCl4·4H2O) were reacted, and the obtained solution was dropped onto a silicon substrate processed by a focused ion beam (FIB). This method utilizes the selective growth of gold nanoparticles on an FIB-processed area of a silicon surface. Raman microspectroscopy revealed that gold nanoparticles selectively grew on an FIB-processed area when an amorphous silicon phase was induced by an FIB. Unlike other attempts to fabricate metal patterns with silane coupling agents, MPTMS acts as a reducing agent, not as glue.
著者
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Hirao Kazuyuki
Department Of Material Chemistry Graduate School Of Engineering Kyoto University
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NISHI Masayuki
Department of Dermatology Kagoshima University Faculty of Medicine
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Nishi Masayuki
Department Of Applied Chemistry Graduate School Of Engineering Osaka Prefecture University
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SHIMOTSUMA Yasuhiko
Innovative Collaboration Center, Kyoto University
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MIURA Kiyotaka
Department of Material Chemistry, Kyoto University
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MATSUOKA Tomoyo
Department of Material Chemistry, Graduate School of Engineering, Kyoto University
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Miura Kiyotaka
Department Of Material Chemistry Graduate School Of Engineering Kyoto University
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Shimotsuma Yasuhiko
Innovate Collaboration Center Kyoto University
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Miura Kiyotaka
Department Of Internal Medicine Division Of Clinical Oncology & Respiratory Medicine Shimane University Faculty Of Medicine
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