Adhesion Strength of TiN Stacked TiO2 Film Correlated with Contact Angle, Critical Load, and XPS Spectra
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概要
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In order to coat TiO2 and TiN/TiO2 films on glass over a large surface area for industrial application, plasma gun and magnetron sputtering processes were used. Also, nitrogen radicals were synthesized on the surface via the atmospheric plasma process. Hydrophilic characteristics were studied via water contact angle. Film adherence was tested via single stylus scratch tester. We also compared the XPS spectra between the nitrogen-synthesized and non-synthesized film and obtained the Ti2p peak shift towards the higher energy level proportional to film adherence. For photocatalytic film durability, the relationship best described, “the higher the critical load, the lower the contact angle, and the higher the binding energy” has become a unique interrelationship among the scratch tester, contact angle, and XPS spectra.
著者
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Ikezawa Shunjiro
Department Of Electronic Engineering Chubu Institute Of Technology
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PARAJULEE Shankar
Department of Electrical and Electronic Engineering, Graduate School of Engineering, Chubu University, Kasugai, Aichi 487-8501, Japan
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HAYAKAWA Masahiro
Department of Electrical and Electronic Engineering, Graduate School of Engineering, Chubu University, Kasugai, Aichi 487-8501, Japan
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IKEZAWA Shunjiro
Department of Electrical and Electronic Engineering, Graduate School of Engineering, Chubu University, Kasugai, Aichi 487-8501, Japan
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