AM05-07-004 レーザ生成プラズマEUV光源用ゼノンドロップレットターゲットの開発(マイクロ・ナノ流体,一般講演)

概要

論文の詳細を見る
A laser produced plasma (LPP) based on a xenon target is a key component of EUV lithography light source systems whose mass production is scheduled for 2010. Especially, a liquid xenon droplet target providing uniform volume and shape is of high interest for EUV generation. In this work, we employed two important technologies for xenon droplet generation under high vacuum condition: 1) continuous jet method to generate uniform droplets from a continuous-jet and 2) differential pumping in order to avoid rapid boiling of the liquid xenon jet under vacuum. In consequence, we succeeded in the generation of uniform xenon droplets in a low pressure (<1Pa) chamber. In this paper, we will report the current status of the xenon droplet target development for a LPP EUV light source. This work was supported by the New Energy and Industrial Technology Development Organization (NEDO), Japan.
日本流体力学会の論文
2005-09-05