Equilibrium of dissolving species in aqueous H_2SiF_6 solution during the liquid phase deposition reaction(<Feature>Aqueous Solution Science for Ceramic Processing II)
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概要
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The equilibrium reaction of H_2SiF_6 solution in the LPD method was investigated by the measurement of UV and IR spectroscopies, vapor pressure and electric conductivity. These measurements were carried out by adding the F^- scavenger such as H_3BO_3 and Al metal which shifts the equilibrium reaction. The experimental results strongly suggested the presence of SiF_4 and [SiF_6・SiF_4]^<2-> in H_2SiF_6 solution. These species were estimated to be involved in the LPD process as intermediates and important for controlling the deposition process of metal oxide.
- 2009-03-01
著者
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MIZUHATA Minoru
Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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DEKI Shigehito
Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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Deki Shigehito
Department Of Chemical Science And Engineering Graduate School Of Engineering Kobe University
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Deki Shigehito
Department Of Chemical Science & Engineering Faculty Of Engineering Kobe University
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Saito Yasuhiro
Dep. Of Chemical Sci. And Engineering Graduate School Of Engineering Kobe Univ.
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SAITO Yasuhiro
Department of Radiology, Asahikawa Medical College
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Mizuhata Minoru
Department Of Chemical Science And Engineering Graduate School Of Engineering Kobe University
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Saito Yasuhiro
Department Of Applied Physics Osaka University
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Saito Yasuhiro
Department Of Chemical Science And Engineering Graduate School Of Engineering Kobe University
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TAKEE Masao
Department of Chemical Science and Engineering, Graduate School of Engineering, Kobe University
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Takee Masao
Department Of Chemical Science And Engineering Graduate School Of Engineering Kobe University
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