Atomic Force Microscope Anodization of Si(111) Covered with Alkyl Monolayer
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概要
- 論文の詳細を見る
Alkyl monolayers on Si were prepared through the reaction between I -alkenes and hydrogen-terminated Si by heat treatment. The monolayers were characterized by atomic force microscopy (AFM), force curve and water contact angle measurements. It was found that surface properties were modified by the formation of highly ordered closely packed monolayers. The monolayers were anodized with a contact-mode AFM by applying voltage between the conductive cantilever and surface under ambient conditions, which resulted in nanometer-scale oxidation of surfaces. After anodization, patterned areas were modified by removing- the silicon oxide and terminating the surface of the grooves with hydrogen atoms by NH_4F etching, and by covering the etched surface with I-octadecene molecules. The monolayers themselves showed high resistance to NH_4F etching and air oxidation. AFM lithography of monolayers anchored covalently on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on Si-C covalent bonds.
- 社団法人応用物理学会の論文
- 2002-07-30
著者
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Tada Hirokazu
Department Of Structural Molecular Science The Graduate University For Advanced Studies:institute Fo
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Tada Hirokazu
Department Of Chemistry University Of Tokyo
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Graaf Harald
Institute For Molecular Science
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Graaf Harald
Institute For Molecular Science Okazaki National Research Institutes
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ARA Masato
Department of Structural Molecular Science, The Graduate University for Advanced Studies
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Ara M
Graduate Univ. Advanced Studies
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