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概要

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In this study, organic compounds in a cleanroom air and on silicon (Si) wafer surfaces were investigated by using thermal desorption-atmospheric pressure ionization mass spectroscopy (TD-APIMS). Si wafers with hydrogen terminate and with native oxygen exposed in a cleanroom were analyzed. As a result, chained hydrocarbons such as C2-C5 alkanes were detected with higher concentrations than phthalates such as DOP and DBF from both Si wafers. And the relationship between the concentration of organic gas species in the cleanroom and organic compounds on Si wafer surfaces was discussed on the tendency of the organic compound adsorption on Si wafer surface. The adsorption mechanisms of organic compounds on Si wafers were discussed by thermal desorption spectra. Based on these results, the adsorption hierarchy model of organic compounds on Si wafer surfaces was proposed.
社団法人日本建築学会の論文
1999-02-28