Strip-Patterned Garnet Films on Substrates with Ion-Beam-Bombarded Micropatterns
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概要
- 論文の詳細を見る
We report the selected-area epitaxy (SAE) of rare-earth iron garnet crystalline and amorphous straight ridge patterns with 8 μm width deposited on Gd_3Ga_5O_<12> substrates. The samples were fabricated by a sputter epitaxial method on substrates that were partially etched by ion-beam bombardment. We found that the stripe pattern direction significantly affects the crystallographic formation of the side wall of the grown ridge.
- 社団法人応用物理学会の論文
- 2000-12-15
著者
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Okamura Yasuyuki
Systems Engineering Wakayama University
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YAMAMOTO Sadahiko
Graduate School of Engineering Science, Osaka University
関連論文
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- Sputter Deposition of Cerium Yttrium Iron Garnet Films on Substrates with Ion-Beam Bombarded Patterns
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